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Gesichts-F.E. 2inch GaN Epitaxial Wafer C lackierte SI Art freie Stellung2024-10-14 17:06:30 |
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350 um 4H SiC-Substrat2022-10-09 16:57:57 |
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Sic n-Art Substrat2022-10-09 16:57:15 |
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6-Zoll-4H-SiC-Substrat N Typ P SBD-Qualität 350 μm2022-10-24 10:23:04 |
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6 Zoll 4H SiC N-Substrat 47,5 mm Keine sekundäre Ebene2022-10-24 10:26:17 |
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N-Typ 6-Zoll-4H-Siliziumkarbid-Substrat Primäre flache Länge 47,5 mm2022-10-24 10:22:34 |
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150 mm 4H SiC-Wafer, halbisolierendes Substrat, 6 Zoll, 350 μm2022-10-24 10:22:12 |
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6-Zoll-N-Typ-Wafer P-MOS-Klasse 4H-SiC-Substrat 350,0 ± 25,0 um2022-10-24 10:21:10 |
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Front Surface Roughness GaN On Silicon Wafer GaN Substrate2022-10-08 17:19:48 |